2011 Oxford Plasmalab Plasmapro NGP 80 PECVD

- Model: Oxford PlasmaPro NGP80 PECVD

- Single Chamber PECVD, non-load locked

- Ideal for R&D

- Process: Oxide and Nitride

- Internal Gas Box with 5 process gases (currently set up for: H2, NH3, Ar/5% SiH4, CHF4, N20, N2)

- Dual frequency RF

- System setup with universal platen (with ability to place various size(s) of substrates).

- Up to 200mm wafer capable

- System PC, Keyboard, Mouse

- Edwards Vacuum Pump

- Vintage 2011

- 208V AC, 60Hz