1998 AMAT Endura 5500 Aluminum Interconnect

PVD (Physical Vapor Deposition)

Deposition Equipment

Date of Manufacture: 1998-01-01

Currently Configured for: 150mm

Asset HDD not included

Vintage1998

Wafer size150mm(JMF)

Buffer RobotHP

Transfer RobotVHP

LoadlockTypeManual

BodyNarrow

CassetteMetal

MappingSTD

IndexerManual

ChAPT STD Lid

ChBCD (Flat) STD Lid

ChEOrient Degas With Temp Moniter

CHFOrient Degas With Temp Moniter

Process Ch1 Ch2 Ch3 Ch4 ChC ChD

Chamber

Process AL TTN GAMMA TIN AL TIN PreClean Chamber WC WB WB WC WB 

Source 11.3 GAMMA G12 11.3 G12 

Magnet A（6”）GAMMA II G12 Ａ（6”） G12

Shutter N/A Linkage N/A N/A N/A 

Gate Valve 2PGV 3PGV 2PGV 2PGV 2PGV 

Water Baffle NA NA NA NA NA 

DC Power 18KS  24KHz(12kｘ2) 24KHz(12kｘ2)18KS 24KHz(12kｘ2)

Buffer Cryo PN: 8116071G001

Transfer Cryo PN: 8116142G001R

Ch1 ESC Pedestal Assembly PN: 0240-76680

Ch1 ESC AC Box PN: 0010-13650

Ch2 ESC AC Box PN: 0010-13650

Ch3 ESC AC Box PN: 0010-13650

ChC ESC AC Box PN: 0010-13650

ChD Wafer Lift Assy PN: 0010-20753

This system can be fully refurbished