AMAT Producer GT Eterna FCVD

PECVD (Chemical Vapor Deposition)

Deposition Equipment

Currently Configured for: 300mm

Asset HDD not included

Ø 2 Twin Chambers

o   2 Remote Plasma Units in each Twin Chamber

o   2 Showerheads and Baffles in each Twin Chamber

o   2 heater plates that rotate while processing

o   2 Rotating Pedestals

·      Aluminum Top Liner that surrounds the pedestal and isolates the chamber body

·      Aluminum Pumping Ring that serves as a pumping channel to pumping port

·      Edge Ring that prevents deposition of by-products on the ped sidewall

o   2 Pedestal Lifts

o   1 Lift Pin

Ø Single TSA Line that splits into 2 and delivers to both showerheads

Ø Manometer Tree

Ø Foreline

Ø Iso and Throttle Valve

Ø Bento Ozone Batch Curing Chamber

o   6 wafer slots

o   Mounted on the side of the FI

Ø Single Axis Aligner

Ø Sub Fab Ozone Generator

Ø 22 Stick Gas Boxes