Varian Semiconductor Equipment Associates (VSEA) M2i

PVD (Physical Vapor Deposition)

Deposition Equipment

Currently Configured for: 150mm

Wafer Size (inches)6

SoftwareACE

Software Version1.1

User ID:M2I

Password:M2I

Is System On-Line?No

OEM Audit Available?No

Can Produce Wafers AS IS?Yes

Any Known Field Modifications?Yes

All Cables Present?Yes

GEM/SECS InterfaceNo

SECS II InterfaceNo

Standard Network Communication CapabilityNo

Machine Electricity 

Frequency60 Hz

Required Voltage208V

Need Transformer?No

WHC & TM Configuration 

Front MonitorFixed

Rear MonitorFixed

DegasYes

Degas VacuumTurboV-250

CoolYes

AlignerYes

DCM RGAMV

Load Lock Vacuum / ModelTurbov-250

Wafer detect sensorYes

TM RGAMV

PM1,2, 3, 4, 5 Configuration 

ConfigSTD Depo

HeaterTableStd

CoolingHeater Exchanger

Chiller TXN/A

Chiller FluidN/A

Chiller HoseN/A

MFC TypeMKS 14790A

PumpCTI Cryo PumpOB-8F

Throttle ValveNo

RGANo

Target PSUGEN 12kW

MagnetronFixed

Motor SpeedFixed

HE Leak portYes

Lamp BakeoutNo

Magnet TypeU3, U5

PM RGA PortYes

Module PressureBaratron

Gas controlMKS 147B, 647B

Support Equipment

Key Common Options  

Cyro CompressorsYes

Manufacturer/ModelCTI Compressor9600    

Quantity2ea

Vacuum PumpsYes     

Pump TypeDry 

Manufacturer/ModelEdwardsQDP40, IQDP40    

Quantity3ea, 1ea