AMAT ENDURA 5500

8"/200mm

Installed and running, with no known issues.

The configuration is as follows:

Chamber Types & Process:

- CH1: Ti (heater 4F)

- CH2: TIN (pedestal)

- CH3: Alu 4F (heater)

- CH4:Alu 4F (heater)

- CHA: Pass-thru

- CHB: Cooldown

- CHC: Preclean II

- CHE: Clamped degas (heater)

- CHF:Standard orient degas

OEM Model Description

AMAT leveraged its expertise in single-wafer, multichamber architecture to develop an evolutionary platform called the Endura 5500 PVD (physical vapor deposition) in 1990 featuring a staged, ultra-high vacuum architecture for the rapid sputtering of aluminum and other metal films used to form the circuit interconnections on advanced devices.