Raith EBPG5000+

1) MAIN SYSTEM EBPG5000plus

a. Beamwriter type EBPG-5000plus Electron Beam pattern generator with 10 position

auto loader/airlock system with thermal control, PLC controlled oil free system and

LaB6 gun operation

Total package includes 20, 50 and 100 keV beam energy capability, fast DC motor

drive for 150mm stage positioning, lambda by 1024 laser interferometer system,

pattern generator with open architecture coupled to an 16bit main deflection and 10

bit trapezia fill-in deflection, laser height-meter system, advanced video system.

System generally to specification to the LaB6 version of document number 928V3.1

Jan 00 and to the LaB6 version of Acceptance Tests document number 938V2.2 Jan 00, with addition as described hereafter.

2) HP Z8 G4 WORKSTATION:

a. Including Linux (Redhat Enterprise 5.4 Tikanga), BEAMS, 16GB DDR42666 DIMM, 2x

SSD 512GB SATA, keyboard, mouse, 2x monitor 24”.

3) ALIGNMENT TOOLS:

a. Substrate pre-alignment microscope incorporating an x-y stage with digital position

read-out, Height-meter facility (not working) and latching mechanism for mounting

EBPG holders.

b. Cathode alignment microscope for setting correct position of electron gun cathode

geometry with illuminator to suit 220v / 50Hz.

4) RE-ALIGNMENT SOFTWARE

a. Direct write registration software for accurate die overlay to previously written

layers.

b. In die alignment option to compensate systematic distortion effects within previous

levels (e.g. stepper block distortion)

c. Global alignment option to automatically measure residual wafer rotation and

provide compensation for stage positioning