Cambridge EBMF 10.5

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Used Cambridge EBMF 10.5
e-beam lithography system as is

Nikon OPTIPHOT-300

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Used Nikon OPTIPHOT-300
12" WAFER AS IS

Hitachi S-6280H

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Used Hitachi S-6280H
AS IS

Kokusai DD1223VN

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Used Kokusai DD1223VN
12" WAFER AS IS

Kokusai DD1223V

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Used Kokusai DD1223V
12" WAFER AS-IS

1996 AMAT Centura HDP→5300Omega

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Used 1996 AMAT Centura HDP→5300Omega
As is, where is 2ch:SiO2 D/E CH-A/B Process Contact window dry etching Wafer Size 8” Wafer Sh...

Nikon OPTIPHOT 200

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Used Nikon OPTIPHOT 200
Metrology Wafer size: 8" Condition: as is

1994 Canon FPA-2500i3

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Used 1995 Canon FPA-2500i3
Stepper Wafer size: 6" Condition: as is

2004 TEL Act 8

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Used 2004 TEL Act 8
Config in images

UFC LF150 Plasma

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Used UFC LF150 Plasma