1987 AG ASSOCIATES Heatpulse 410 Benchtop Rapid Thermal Annealing Tool

• Single Wafer Process
• Single Rotometer Controlled Gas Channel
• Multi-Step Process Cycle Capability
• Programmable Ramp-Up Rates from 10ºC-250ºC/sec.
• 450 - 1150ºC Recommended Operating Temp Range; 1,250ºC Peak Temperature
• Thermocouple Temperature Control
• 1-300 Seconds Processing Cycle
• PC Controller with pCat Software
• 208V, 3Ph, 60Hz, 90A Input Power

Refurbished YES

Condition Excellent

Exterior Dimensions   Width 18.000  in  (45.7 cm)  Depth 16.500  in  (41.9 cm)  Height 10.250  in  (26.0 cm)