Applied Materials 8330

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Used Applied Materials 8330
Applied Materials 8330 Metal Etch 150 mm system for etching Metal

2000 Applied Materials VSE - VIIsion

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Used 2000 Applied Materials VSE - VIIsion
Tool called `HS25` - supposed to leave the cleanroom middle of April22 USED AMAT VSE - VIIsion ...

Applied Materials Vantage RadOX

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Used Applied Materials Vantage RadOX
Applied Materials Vantage RadOX Semiconductor Fabrication Rapid Thermal Processing Equipment P...

Applied Materials Vantage Radiance RTN_ISSG

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Used Applied Materials Vantage Radiance RTN_ISSG
Wafer size: 300mm 2 Chamber radiance ISSG Semiconductor fabrication Rapid thermal processing e...

2011 Applied Materials Producer eXT

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Used 2011 Applied Materials Producer eXT
Process: poly etch Wafer size: 300mm Carrier: FOUP (Comply with SEMI E47.1 (25wafers)) Load Po...

Applied Materials Centura Radiance RPO

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Used Applied Materials Centura Radiance RPO
Wafer size: 300mm

Applied Materials Producer eXT

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Used Applied Materials Producer eXT
Wafer size: 300mm

APPLIED MATERIALS as05111-08 KVM CONTROLLER VIDEO SWITCH (rbd2.1b4)

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Used APPLIED MATERIALS   as05111-08 KVM CONTROLLER VIDEO SWITCH (rbd2.1b4)
APPLIED MATERIALS as05111-08 KVM CONTROLLER VIDEO SWITCH (rbd2.1b4) used

Applied Materials P 5000 Mark II-J

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Used Applied Materials P 5000 Mark II-J
Chemical Vapor Deposition (CVD) Wafer Size: Equipment Configuration: – SBC Board Model: SV21 –...

Applied Materials P5000

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Used Applied Materials P5000
STATUS:USED INSTALLATION POSSIBLE ON: P5000 5000 cvd universal teos

Applied Materials P5000 Configured chamber without gasbox

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Used Applied Materials P5000 Configured chamber without gasbox
STATUSUSED INSTALLATION POSSIBLE ONP5000

1996 Applied Materials 5200 Centura Dry Etch Cluster Tool

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Used 1996 Applied Materials 5200 Centura Dry Etch Cluster Tool
There are four chambers; 3 MxP+ oxide and 1 DPS poly Applied Materials 5200 Centura Dry Etch Clu...