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Process: wet oxidation Condition: as is Wafer size: 12"

Process: Furnace(ALD NITRIDE) Condition: initial passed Wafer size: 12"

Process: CVD Wafer size: 4" Condition: as is

Process: BCD PLOY Condition: AS-IS Wafer size: 12"

Very little used, in top condition Data sheet (in German) in attachment

KLA 6200 for sale in Refurbished condition. Optional Calibration Wafers available if required 4...

Chemical Vapor Deposition (CVD) Wafer Size: Equipment Configuration: – SBC Board Model: SV21 –...

Type: Chemical Vapor Deposition (CVD) Equipment Configuration: – 2 Chambers

Type: Semi-Automatic Probe Station Wafer Size: 8"

Handler

Type: Field Emission Scanning Electron Microscope (FE-SEM)

LAM Alliance 4.1 ICP Etcher 2set