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Air Products AP10 Gasgard Process Gas Panel
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Complete, removed from production, used for sIh4
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Air Products AP10 Gasgard Process Gas Cabinets
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Complete, removed from production, used for H2, no enclosure
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Universal Advantis AC72 chip placer
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Universal Advantis AC72 vintage 2006/2007 placed components only 1.740.000 AUTOMATIC PWC REMOVABL...
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Ulvac Entron W-200T6 PVD Sputtering Tool
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2006 tool. Ulvac PVD/CVD. Can be reconfigured to 6 PVD chambers. Entron W-200T6 System (1E3T2H) –...
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Vertical LPCVD Furnace TELINDY Oxide
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Make: Tokyo Electron Ltd.
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Vertical Furnace - Other
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Make: Tokyo Electron Ltd. Quantity: (2)
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Batch Wafer Processing
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Make: Tokyo Electron Ltd.
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Parts/Options
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Make: Nexest Systems Corporation
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Vertical LPCVD Furnace Quixace II ALD TiN
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Make: Kokusai Electric Co., Ltd.
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Vertical LPCVD Furnace Quixace II ALD High-k
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Make: Kokusai Electric Co., Ltd.
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FOUP
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Make: Entegris Quantity: (2)
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Wafer Scrubber
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Make: Dainippon Screen Mfg. Co. Quantity: (2)
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