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Accretech/TSK UF200
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Production Wafer Prober Wafer Prober Equipment details: Date of Manufacture: 1998 Currently C...
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1998 Accretech/TSK UF200
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Production Wafer Prober Wafer Prober Equipment details: Date of Manufacture: 1998 Currently C...
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NIKON V-12A
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Optical comparator Inspection Equipment details: Date of Manufacture: Currently Configured fo...
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2003 Matrix Integrated Systems Bobcat 208
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Bobcat 208 Stripper/Asher Etch/Ash/Clean - Plasma Processing Date of Manufacture: 2003-05-30 ...
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2007 Semitool Inc. Scepter Acid
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Batch Wafer Processing Etch/Clean - Wet Processing Date of Manufacture: 2007-12-31 Currently C...
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2008 Semitool Inc. SST-C-421-280
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Batch Wafer Processing Etch/Clean - Wet Processing Date of Manufacture: 2008-12-31 Currently C...
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2005 Suss Microtec AG ACS200
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Linear Wafer Tracks (Resist Coater/Developer) Resist Processing Equipment Date of Manufacture: ...
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Fusion Semiconductor Systems 200PCUP
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UV Cure System Resist Processing Equipment Currently Configured for: 200mm Date of Audit 22 Ma...
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2002 ATV Technologie GmbH PEO-603
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Horizontal Furnace Furnaces/Diffusion Systems Date of Manufacture: 2002-12-31 Currently Config...
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2002 Applied Microengineering Ltd (AML) AWB08
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Wafer Bonder Wafer Level Packaging Date of Manufacture: 2002-12-31 Currently Configured for: 2...
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2011 ATV Technologie GmbH PEO-603
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Horizontal Furnace Furnaces/Diffusion Systems Date of Manufacture: 2011-12-31 Currently Config...
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YES 1224 P Chemical Vapor Deposition (CVD) System
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With: - Plasma source - Multiple trays - Mounting table - CVD Injector system clogged
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