Type: Mask Particle Detection System Equipment Configuration: - Comes with Asyst PN 9700-4314-01...

Oxide Etcher DRY ETCHER => No missing

2CH Oxide Etch More images in attachment Missing parts of 1CH out of 2CH B-ch: Cathode A'ssy m...

Duplex Spin Rinse Dryer Wafer Size: 6", 8" Equipment Configuration: 2017 Vintage

Reticle: Size 6" square t=? (Nikon Style or Canon Style reticle loader?): 6” Reticle / t= 0,...

This Zeiss Axiovert 200M Inverted Fluorescence Microscope System was removed from a university la...

Objective lens 3X Eyepiece CFWN10X/20 Power supply AC100/120/230V~ 1.5/1.3/0.7A 50/60Hz Stroke...

SEM

- Voltage: 200VAC - 3 Phase - 50/60Hz, Full Load Amps: 57A - Spindle Max. Revolution: 3000min. ...

Wafer Inspection System