Configs: Stage: 8x6 Eyepiece CFWN10X/20 Objective lens: 5X, 10X, 20X, 50X Power supply: AC100V...

193NM scanner

6"

i-Line stepper 0.45um

Nikon Eclipse L200 microscope with 5/10/20/50/100 LU Plan BD objectives for brightfield and darkf...

Nikon Eclipse L200N inspection microscope with brightfield and darkfield episcopic illumination ...

8" As-is 3 available

Tool Status Running Wafers Wafer Size 300 mm Fab Section Lithography Asset Description Lithogr...

Lithography Step and repeat scanning system Tool Status Running Wafers Wafer Size 300 mm Fab S...

200mm Fab Section Lithography Software Version MCSV E3.42, OCSV E3.42, CIM SECS Process Litho...

Reflected and transmitted light 5x/10x/20x/50x/100x LU Plan BD objectives Brightfield, darkfiel...

Description L W H Qty Main Body 90 78 100 1 Front Loader Unit 75 35 100 1 Refrigeration 84 35 ...