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2003 Matrix Integrated Systems Bobcat 208
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Bobcat 208 Stripper/Asher Etch/Ash/Clean - Plasma Processing Date of Manufacture: 2003-05-30 ...
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2007 Semitool Inc. Scepter Acid
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Batch Wafer Processing Etch/Clean - Wet Processing Date of Manufacture: 2007-12-31 Currently C...
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2008 Semitool Inc. SST-C-421-280
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Batch Wafer Processing Etch/Clean - Wet Processing Date of Manufacture: 2008-12-31 Currently C...
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2005 Suss Microtec AG ACS200
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Linear Wafer Tracks (Resist Coater/Developer) Resist Processing Equipment Date of Manufacture: ...
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2002 ATV Technologie GmbH PEO-603
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Horizontal Furnace Furnaces/Diffusion Systems Date of Manufacture: 2002-12-31 Currently Config...
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2002 Applied Microengineering Ltd (AML) AWB08
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Wafer Bonder Wafer Level Packaging Date of Manufacture: 2002-12-31 Currently Configured for: 2...
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2011 ATV Technologie GmbH PEO-603
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Horizontal Furnace Furnaces/Diffusion Systems Date of Manufacture: 2011-12-31 Currently Config...
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YES 1224 P Chemical Vapor Deposition (CVD) System
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With: - Plasma source - Multiple trays - Mounting table - CVD Injector system clogged
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1998 TEL CLEAN TRACK ACT 8 SINGLE BLOCK
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Single Block (Resist Coater/Developer) Resist Processing Equipment Date of Manufacture: 1998-12...
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CEE 1110 hot plate for maximum 200mm wafer, 50-300C, manual load, inert gas purge, 110v
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10"x10" programmable hot plate for max 200mm wafers Inert gas purge in lid
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CEE 1100 hot plate for maximum 200mm wafers, 50-300C, manual load, 110v
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10"x10" Programmable hot plate for max 200mm wafers
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Karl Suss RC-5 spin coater with Gyrset for max 5in substrates
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Includes 2 Manostat peristaltic pumps for photoresist dispense max 5" diameter substrate or 4"x4...
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