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2000 ESCO LTD. EMD-WA1000S
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ESCO Ltd. EMD-WA1000S Temperature Desorption Analyzer Currently Configured for 200mm wafer size...
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Nikon AMI-3500
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Nikon AMI-3500 EQUIPMENT DETAILS: Tool is in a clean room. Equipment Type: AMI-3500 Model:AMI...
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JEOL JWS-7555
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JEOL JWS-7555 SEM - Defect Review (DR) Currently Configured for 200mm wafer size MFG Date: TBC...
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2001 Tokyo Electron Ltd. NS 300
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Tokyo Electron Ltd. NS 300 Wafer Scrubber MFG Date: 2001 EQUIPMENT DETAILS: • Currently Config...
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Tokyo Electron Ltd. Trias Ti/TiN Chamber
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Tokyo Electron Ltd. Trias Ti/TiN Chamber Parts/Peripherals Currently Configured for 300mm wafer ...
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2013 Tokyo Electron Ltd. TELINDY Plus IRAD Oxide
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Tokyo Electron Ltd. TELINDY Plus IRAD Oxide Vertical LPCVD Furnace Currently Configured for 300m...
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Aviza Technology, Inc. RVP-300
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Aviza Technology, Inc. RVP-300 Vertical Diffusion Furnace Currently Configured for 300mm wafer ...
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Applied Materials Centura AP Enabler
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Applied Materials Centura AP Enabler Dielectric Etch Currently Configured for 300mm wafer size ...
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2007 P.S.K. Tech Inc Supra IV
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P.S.K. Tech Inc. Supra IV Stripper/Asher Currently Configured for 300mm wafer size MFG Date: 20...
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2010 Lintec Rad 2000 M8 UV Irradiator
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2011 JEOL JSM 7001F Schottky Emission SEM
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Resolution: 1.2 nm at 30 kV, 3.0 nm at 1.0 kV Accelerating Voltage: 0.5 to 30 kV Specimen Stage...
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AMAT Viista High Current Implanter
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