Nikon OPTISTATION V

Nikon OPTISTATION V
Nikon OPTISTATION V Optical Review System Currently Configured for 200mm wafer size ※ Inspect ...

2000 ESCO LTD. EMD-WA1000S

2000 ESCO LTD. EMD-WA1000S
ESCO Ltd. EMD-WA1000S Temperature Desorption Analyzer Currently Configured for 200mm wafer size...

JEOL JWS-7555

JEOL	 JWS-7555
JEOL JWS-7555 SEM - Defect Review (DR) Currently Configured for 200mm wafer size MFG Date: TBC...

2010 Oxford Instruments X-Strata980

2010 Oxford Instruments	 X-Strata980
Oxford Instruments X-Strata980 X-ray Fluorescence Spectrometer MFG Date: 2010 EQUIPMENT DETAIL...

2005 KLA-Tencor Corp. SpectraCD 100

2005 KLA-Tencor Corp. SpectraCD 100
KLA-Tencor Corp. SpectraCD 100 Film Thickness Measurement System Currently Configured for 300mm...

Nikon OPTISTATION 3100

Nikon OPTISTATION 3100
OPTISTATION 3100 Nikon Optical Review System Metrology Equipment

Carl Zeiss Group Axiotron 300

Carl Zeiss Group	 Axiotron 300
Carl Zeiss Group Axiotron 300 Microscope Currently Configured for 300mm wafer size EQUIPMENT D...

KLA-Tencor Corp. Puma 9120

KLA-Tencor Corp. Puma 9120
Puma 9120 KLA-Tencor Corp. Darkfield Inspection Metrology Equipment

Nikon AMI-3000

Nikon AMI-3000
AMI-3000 Nikon Macro-Defect Metrology Equipment

2007 Applied Materials Uvision 200

2007 Applied Materials Uvision 200
Applied Materials Uvision 200 Brightfield Inspection Currently Configured for 300mm wafer size ...

Veeco Instruments Inc. Dimension X1D

Veeco Instruments Inc. Dimension X1D
Dimension X1D Veeco Instruments Inc. Atomic Force Microscope (AFM) Metrology Equipment

KLA-Tencor Corp. eS32

KLA-Tencor Corp. eS32
eS32 KLA-Tencor Corp. E-beam Inspection Metrology Equipment