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1996 Applied Materials AMAT P-5000 Mark II DLH PECVD TEOS
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PECVD (Chemical Vapor Deposition) Deposition Equipment Currently Configured for: 200mm Softwar...
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1991 Applied Materials AMAT P-5000 Mark II DLH PECVD Silane
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PECVD (Chemical Vapor Deposition) Deposition Equipment Currently Configured for: 200mm Softwar...
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1991 Applied Materials AMAT P-5000 Mark II DLH Delta PECVD Silane
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PECVD (Chemical Vapor Deposition) Deposition Equipment Currently Configured for: 200mm Softwar...
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1994 Applied Materials AMAT P-5000 Mark II WxZ
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Metal CVD (Chemical Vapor Deposition) Deposition Equipment Currently Configured for: 200mm Sof...
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2001 BTI BDF-41 Oxide
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4 stovepipes that can be operated independently Other Information No quartz components; Used h...
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2016 Aixtron IC2 G5 GaN
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-8x6" GaN tool, converted to use Chlorine cleaning with upgraded-design exhaust , and comes with ...
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2016 Aixtron IC2 G5
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-8x6" GaN tool, converted to use Chlorine cleaning with upgraded-design exhaust , and comes with ...
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2007 AMAT P5000 21
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VendorAMAT Tooltype P5000 Qty. of Chambers4 Spares tosellNo WaferDiameter6 Date of availabil...
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Orthodyne OE M360C
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Orthodyne M360C Heavy wire Bonder 1 360c bondhead for can rotation 360degree 2. PR board CPU bo...
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2000 AMAT MS9 E500 EHPI
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Wafer Size Range Minimum 150 mm Maximum 150 mm Set Size 150 mm Condition Good Year of Manufact...
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2003 AMAT 200mm Centura II
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Centura MF II Software: Vita Controller Indexer: Narrow Body / Tilt out mit Dummy Wafer Storage...
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KLA-Tencor Corp. KLA 5200XP
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Overlay Measurement System Metrology Equipment Currently Configured for: 200mm
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