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2000 Eaton Nova Axcelis NV GSD 200 EE
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It’s still installed but no longer under power. It was in Working Condition when decommissioned....
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2012 EKRA X4
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AMAT Endura 5500 Aluminum Interconnect
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PVD (Physical Vapor Deposition) Deposition Equipment Currently Configured for: 200mm Software:...
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2000 ASM Advance 400
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ASM Furnace Vertical - Advance 400 2x Reactor Dot. Poly Low Pressure Wafer Size Range Minimum ...
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1999 ASM Advance 400
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ASM Furnace Vertical - Advance 400 2 Reactors atmospheric Wafer Size Range Minimum 150 mm Maxi...
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2008 ASM Advance 400
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ASM Furnace Vertical - Advance 400 2 Reactor atmospheric Robot defect and need service Wafer S...
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1999 ASM Advance 400
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OFENV01D Furnace with 2 Tubes 1x Reactor Dot. Poly Low Pressure 1x Reactor Atmosphere WET-OXID...
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2019 Tokyo Electron Ltd. CLEAN TRACK ACT 8 COAT ONLY
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Coat only Track Resist Processing Equipment Date of Manufacture: 2019-01-01 Currently Configur...
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2017 RENA Technologies GmbH RENA BatchW
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Batch Wafer Processing Etch/Clean - Wet Processing Date of Manufacture: 2017-01-01 Currently C...
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2020 Polyteknik Flextura Sputter
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PVD (Physical Vapor Deposition) Deposition Equipment Date of Manufacture: 2020-01-01 Currently...
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2000 AMAT MS9 E500 EHPI
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Wafer Size Range Minimum 150 mm Maximum 150 mm Set Size 150 mm Condition Good Year of Manufact...
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2003 AMAT 200mm Centura II
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Centura MF II Software: Vita Controller Indexer: Narrow Body / Tilt out mit Dummy Wafer Storage...
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