Status of Equipment: Crated Specification: Secondary electron image resolution: 2.1nm at 1kV 1...

Process Type: FA SEMs/TEMs/Dual Beams Date of Manufacture: 2015 Status of Equipment: De-install...

Process Type: FA SEMs/TEMs/Dual Beams Date of Manufacture: 2018 Equipment Information: Apreo C...

Process Type: Wet Processing Wafer Size: 300mm Date of Manufacture: 2008 System Power Rating: ...

Process Type: Metrology & Inspection Wafer Size: 300mm Date of Manufacture: 2008 Status of Equ...

Aleris 8350 300mm

Process Type: TXRF De-installed

Process Type: Wet Processing Wafer Size: 300mm Status of Equipment: Refurbished SEZ DV34, only...

Process Type: Wet Bench Date of Manufacture: 2017 Phosphoric Acid, detailed configuration attac...

Process Type: signal generator

Process Type: Pulse Generator

Process Type: prober