Can be sold As Is or can be configured to meet your requirements Batch Wafer Processing Etch/Cl...

Agilent7500a ICP-MS CONFIGURATION DETAILS: 7500a ICP-MS 7500 ICP-MSChemstation（Ver. B.02.01） ...

Complete S-3200N SEM with Oxford INCAx-act Detector Oxford INCAx-act Detector Vintage 2009 Res...

Nordson / March AP 1000 Plasma System - 50 Hz - CB Current: 25 A - SCCR: 10 kA 2023 Vintage

Varian E 500 HP , 8" With: - Dry Pump, Booster Pump - Cryo Compressor - Turbo Pump (2) - PC ...

[PVD (Physical Vapor Deposition)](https://www.macquarie.com/au/en/about/company/commodities-and-g...

Description:High current implanterVersion:200 mmVintage:01.06.2002 -Professionally deinstalled f...

Scanning Acoustic Microscopy (SAM) / Tomography (SAT) Reliability Lab Date of Manufacture: 2017...

- Includes thin wafer handling kit - 6" - Can be converted to 8" -250KV max beam energy - 50/...

Tungsten CMP CMP Equipment Currently Configured for: 300mm Current Equipment Status: Available...

Hitachi HT S-9380 semiconductor equipment for 300 mm (12-inch) wafers, manufactured in November 2...

Polysilicon Etch Etch/Ash/Clean - Plasma Processing Date of Manufacture: 2005-01-10 Currently ...