Wafer size: 300mm Asset HDD not included Vertical Furnace Process: NITR

Vertical Furnace Furnaces/Diffusion Systems Equipment details: Date of Manufacture: 2003 Curr...

Vertical Furnace Furnaces/Diffusion Systems Equipment details: Date of Manufacture: 2003 Curr...

Wafer size: 300mm Semiconductor Fabrication Deposition Equipment ALD (Atomic Layer Deposition)

Crated and kept in a bonded facility Hot chuck (dual temp) WAPP GPIB Automatic frame prober ...

Yaskawa Electric linear motor controller, model CLSR-42-N2CB, part number 4S587-156, designed for...

This industrial pneumatic assembly was removed from Nikon semiconductor manufacturing equipment a...

Brand new and unused EPI Centura ACP 300 mm 4 Chambers; Chamber code RH3, Lamp type BNA8 R3 Mai...

Automatic Wafer Optical Inspection System Robot not working

Manual 300mm Laminator It was used for mounting wafer onto frames. It has a winding unit for li...

Silicon non-contact thickness measurement Technical specifications: Sensor system with a StraOe...