Fusion Semiconductor Systems 200PCUP

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Used Fusion Semiconductor Systems 200PCUP
UV Cure System Resist Processing Equipment Currently Configured for: 200mm Date of Audit 22 Ma...

2002 ATV Technologie GmbH PEO-603

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Used 2002 ATV Technologie GmbH PEO-603
Horizontal Furnace Furnaces/Diffusion Systems Date of Manufacture: 2002-12-31 Currently Config...

2002 Applied Microengineering Ltd (AML) AWB08

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Used 2002 Applied Microengineering Ltd (AML) AWB08
Wafer Bonder Wafer Level Packaging Date of Manufacture: 2002-12-31 Currently Configured for: 2...

2011 ATV Technologie GmbH PEO-603

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Used 2011 ATV Technologie GmbH PEO-603
Horizontal Furnace Furnaces/Diffusion Systems Date of Manufacture: 2011-12-31 Currently Config...

YES 1224 P Chemical Vapor Deposition (CVD) System

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Used YES 1224 P Chemical Vapor Deposition (CVD) System
With: - Plasma source - Multiple trays - Mounting table - CVD Injector system clogged

1998 TEL CLEAN TRACK ACT 8 SINGLE BLOCK

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Used 1998 TEL CLEAN TRACK ACT 8 SINGLE BLOCK
Single Block (Resist Coater/Developer) Resist Processing Equipment Date of Manufacture: 1998-12...

CEE 1110 hot plate for maximum 200mm wafer, 50-300C, manual load, inert gas purge, 110v

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Used
10"x10" programmable hot plate for max 200mm wafers Inert gas purge in lid

CEE 1100 hot plate for maximum 200mm wafers, 50-300C, manual load, 110v

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Used
10"x10" Programmable hot plate for max 200mm wafers

Karl Suss RC-5 spin coater with Gyrset for max 5in substrates

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Used
Includes 2 Manostat peristaltic pumps for photoresist dispense max 5" diameter substrate or 4"x4...

2012 TSK UF-2000 Wafer Prober

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Used 2012 TSK UF-2000 Wafer Prober
10 available Vintages: 2012 (1), 2011 (2), 2010 (3), 2009 (1), 2007 (3) Power ON Hinge: MHF400...

1997 TEL CLEAN TRACK ACT 8 MULTI BLOCK

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Used
Multi Block (Resist Coater/Developer) Resist Processing Equipment Date of Manufacture: 1997-12-...

KLA RS 75 TCA

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Used KLA RS 75 TCA
150 / 200 mm The tool needs some refub work, but can be sold either way.