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2017 Tokyo Electron Ltd. CLEAN TRACK ACT 8 MULTI BLOCK
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Multi Block (Resist Coater/Developer) Resist Processing Equipment Date of Manufacture: 2017-01-...
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2019 Tokyo Electron Ltd. CLEAN TRACK ACT 8 COAT ONLY
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Coat only Track Resist Processing Equipment Date of Manufacture: 2019-01-01 Currently Configur...
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Tokyo Electron Ltd. Cellesta+
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Cellesta+ Tokyo Electron Ltd. Single Wafer Processing Etch/Clean - Wet Processing
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2001 Tokyo Electron Ltd. NS 300
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Tokyo Electron Ltd. NS 300 Wafer Scrubber MFG Date: 2001 EQUIPMENT DETAILS: • Currently Config...
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Tokyo Electron Ltd. Trias Ti/TiN Chamber
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Tokyo Electron Ltd. Trias Ti/TiN Chamber Parts/Peripherals Currently Configured for 300mm wafer ...
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2013 Tokyo Electron Ltd. TELINDY Plus IRAD Oxide
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Tokyo Electron Ltd. TELINDY Plus IRAD Oxide Vertical LPCVD Furnace Currently Configured for 300m...
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2006 Tokyo Electron Ltd. Trias W
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Vintage: 2006 (1) 2005 (1) Tokyo Electron Ltd. Trias W Currently Configured for: 300mm Asset ...
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2008 Tokyo Electron Ltd. Telius SP-305 SCCM
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Vintage: 2008 (1) 2007 (1) 2005 (1) 2003 (1) Wafer size: 300mm Asset HDD not included Soft...
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Tokyo Electron Ltd. ALPHA-303i Nitride
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Wafer size: 300mm Asset HDD not included Vertical Furnace Process: OXYNIT
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2014 Tokyo Electron Ltd. Tactras Vesta
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Vintage: 2014 Wafer size: 300mm Asset HDD not included Tool config is based on original PO, pl...
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Tokyo Electron Ltd. Expedius
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Tokyo Electron Ltd. Expedius Batch Wafer Processing Currently Configured for 300mm wafer size M...
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2014 Tokyo Electron Ltd. ALPHA-303i Anneal
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2014 Tokyo Electron Ltd. ALPHA-303i Anneal Production wafers:75 Process Gas: H2(F.S:15slm), O2(...
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