2011 RUDOLPH MetaPulse-III 300XCu Metal Thickness WAFER SIZE: 12

1996 RUDOLPH FE-VII Film Thickness WAFER SIZE: 8

Leica INS3300 is the most advanced solution in the production control of 200 mm and 300 mm wafers...

KLA Tencor Alpha-Step 500 Surface Profiler Selling as is, No PC or Software included Located in o...

Nikon Optistation VII 300mm Wafer inspection System 2 Sets of Nikon Optistation VII complete and ...

RECIF SPP8 Wafer Transfer for 200mm Wafers Mfg Date: 1996 Tabletop Vacuum Free Horizontal Tran...

Dektak 3030 Sold in working condition. See demo video's attached

This system is a completely self-contained, compact, bench-top precision ion polishing system des...

Model number:ALPHA-303i TEOS Vertical Furnace Furnaces/Diffusion Systems Currently Configured ...

HIAC Model 5120 Particle Counter - 16 channels - it has never been used

Shimadzu DUH 202 Ultra Micro Hardness Tester

PECVD Equipment for Barrier RC1: SiCx, RC2:Aurora2.7 Wafer Size 12 Inch