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2001 Hitachi Kokusai VR120/ 08S
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Process: resistivity measurement Wafer size: 12" Condition: as is
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SVS MSX-1000
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Process: lift off M/C Condition: as is Wafer size: 4"
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2009 SEMILAB WT-2000PVN
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Process: lifetime measurement Condition: complete
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BMR HiEtch-LX200
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Process: ICP etcher Wafer size: 12" Condition: as is
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1999 Tel ACT 8
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Wafer size; 8" Process: track Condition: part tool
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2002 DNS 80B
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Condition: as is Wafer size: 8" Process: track
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AMAT P5000
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Process: Preclean Etchx1, Oxide CVD x2 Condition: as is Wafer size: 8"
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ASML Yieldstar-S1250
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Process: Overlay Measurement Condition: as is Wafer size: 12"
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2004 Rudolph AXI-S
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Process: Macro Defect Inspection Condition: as is Wafer size: 12"
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2009 Rudolph MP3 300XCu
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Process: Thickness Measurement Wafer size: 12" Condition: as is
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2011 Camtek AIM1 (Xact200)
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Process: analyzing Condition: as is
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2007 Seiko NS 7000 Handler
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Vintage: 2007 (see images for specs)
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