* Vintage : 2014 * Main Body : Endura CL(XP) 12" * Chamber ; 2CH

* Model : CRIUS II * 2 inch x 55ea * GaN application * Same wafer loading capacity as Aixtron ...

* Size : 8inch * As-is

* Size : 6inch * Conditon ; working

Vintage: 2006 (2) 2004 (1) Wafer size: 300mm Process: DIFF

As-is where-is condition

Category: metrology Equipment: inspection Process: Wafer-Edge Inspection Wafer Size: 300mm

300mm 4 loadports configuration wafer ID reading no flipping One loadport is down and we don’...

Category: thin film CVD Process: PECVD-Oxynitride Wafer size: 300mm

Process: DIFFUSION Wafer Size: 300mm Category: diffusion Equipment: furnace Process: anneal

Process: DIFFUSION Wafer Size: 300mm Equipment: furnace Process: HfO2-ALD

Wafer Size: 150mm Category: Etch Process: Metal Etcher Equipment: Dry Etcher