Wafer size: 12" Process: Ti/TiN Category: Thin film Equipment: CVD

Wafer Cleaner

Wafer Size: 300mm Process: CVD Category: Thin film

Process: DIFFUSION Wafer Size: 300mm Category: Diffusion Furnace Process: ALD SiN

Wafer size: 12" Category: Thin film CVD

Wafer size: 12" Category: Thin film CVD

Wafer Size: 300mm Process: ETCH Category: Etch

Wafer Size: 300mm Category: Metrology Concentration Process: PL Mapping

Process: Back-end Wafer size: 8" PKG

Wafer size: 12" Diffusion Furnace Process: LTO POLY

- It was upgraded 5 years ago to Windows control, now running under Windows 10. - There is a thi...

Verteq 1800-50 Single Stack Spin Rinser/Dryer (X3) Verteq 1800-50 Spin Rinser/Dryer. A front-lo...