12" As-is

8" As-is

8" As is

1C2D 8" As-is

2C2D As-is 6"

2 available 12" As-is 1x 2coater 2B.L Cot 4Developer

12" WAFER 4 available As-is

System accuracy: < 5 μm 3σ Printable area: 327 x 227 mm (DIN A4) Substrate thickness: max. 25 m...

Operating temperatures from 5°C above room temperature up to 250°C Capacity: 115 L Natural air ...

The Spin Rinse Dryer is used for rinsing and drying substrates. Max. size: 8" low profile, NOT A...

Up to 12" - The Spin Rinse Dryer is used for rinsing and drying substrates up to 12" round or 7"...

- thin film deposition - encapsulation - coating - eg SiO 2 , SiN x , SiON x , a Si - up to 2...