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YES 1224 P Chemical Vapor Deposition (CVD) System
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With: - Plasma source - Multiple trays - Mounting table - CVD Injector system clogged
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1998 TEL CLEAN TRACK ACT 8 SINGLE BLOCK
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Single Block (Resist Coater/Developer) Resist Processing Equipment Date of Manufacture: 1998-12...
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CEE 1110 hot plate for maximum 200mm wafer, 50-300C, manual load, inert gas purge, 110v
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10"x10" programmable hot plate for max 200mm wafers Inert gas purge in lid
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CEE 1100 hot plate for maximum 200mm wafers, 50-300C, manual load, 110v
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10"x10" Programmable hot plate for max 200mm wafers
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Karl Suss RC-5 spin coater with Gyrset for max 5in substrates
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Includes 2 Manostat peristaltic pumps for photoresist dispense max 5" diameter substrate or 4"x4...
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2012 TSK UF-2000 Wafer Prober
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10 available Vintages: 2012 (1), 2011 (2), 2010 (3), 2009 (1), 2007 (3) Power ON Hinge: MHF400...
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1997 TEL CLEAN TRACK ACT 8 MULTI BLOCK
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Multi Block (Resist Coater/Developer) Resist Processing Equipment Date of Manufacture: 1997-12-...
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KLA RS 75 TCA
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150 / 200 mm The tool needs some refub work, but can be sold either way.
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HITACHI S-9380
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Complete system except the HDD but if you want the HDD, it can be supplied with additional cost. ...
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1993 AMAT P5000 PECVD tool 3 Chamber
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AMAT P5000 PECVD 3 Chamber SiN process, it is complete and has no missing parts. - 3 Chamber 150...
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2022 Seica PILOT V8XL
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Description probe: Flying Probe Tester Vintage 2022
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AMAT Chamber Wide Body PVD, Shell, 0040-20195, Endura, IMP, 424163
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