YES 1224 P Chemical Vapor Deposition (CVD) System
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With: - Plasma source - Multiple trays - Mounting table - CVD Injector system clogged
1998 TEL CLEAN TRACK ACT 8 SINGLE BLOCK
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Single Block (Resist Coater/Developer)
Resist Processing Equipment
Date of Manufacture: 1998-12...
CEE 1110 hot plate for maximum 200mm wafer, 50-300C, manual load, inert gas purge, 110v
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10"x10" programmable hot plate for max 200mm wafers Inert gas purge in lid
CEE 1100 hot plate for maximum 200mm wafers, 50-300C, manual load, 110v
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10"x10" Programmable hot plate for max 200mm wafers
1997 TEL CLEAN TRACK ACT 8 MULTI BLOCK
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Multi Block (Resist Coater/Developer)
Resist Processing Equipment
Date of Manufacture: 1997-12-...
HITACHI S-9380
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Complete system except the HDD but if you want the HDD, it can be supplied with additional cost. ...
1993 AMAT P5000 PECVD tool 3 Chamber
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AMAT P5000 PECVD 3 Chamber SiN process, it is complete and has no missing parts.
- 3 Chamber 150...
Weiss WT3 Temperature oven
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Type: Weiss WT3-340/70
Very good condition
Weiss temperature cabinet with SIMCON / 32 control A...
KLA Candela CS20R
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Particle counter for transparent wafer 6 Inch As is cold down Was working before de-install,
SMC Serial Interface I/O Unit
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Model No.
EX140-SSD1-X16
Height Mtrs
.19 Mtrs
Width Mtrs
.13 Mtrs
Depth Mtrs
.05 Mtrs
Shi...












