Wafer Scrubber Etch/Clean - Wet Processing Date of Manufacture: 2005-04-01 Currently Configure...

i-Line Stepper Lithography Equipment Date of Manufacture: 1998-12-31 Currently Configured for:...

Dielectric Etch Etch/Ash/Clean - Plasma Processing Date of Manufacture: 1999-01-01 Currently C...

AMAT P5000 PECVD 3 Chamber SiN process, it is complete and has no missing parts. - 3 Chamber 150...

- 208 V, 50/60 Hz, 3 Phase - Full Load Current: 120 Amps - Largest Load Ampere Rating: 32 Amps ...

Signatone CheckMate CM 210 Probe Station 2012 Vintage

The S4 EXPLORER is the most compact, high performance wavelength dispersive X-ray fluorescence sp...

Stripper/ asher Wafer Size: 150mm

Metal Etch Etch/Ash/Clean - Plasma Processing Currently Configured for: 150mm Install TypeThro...

Metal Etch Etch/Ash/Clean - Plasma Processing Currently Configured for: 150mm Install TypeStan...

PVD (Physical Vapor Deposition) Deposition Equipment Date of Manufacture: 1997-12-31 Currently...

PVD (Physical Vapor Deposition) Deposition Equipment Currently Configured for: 200mm Software:...