NANOMETRICS Nano 9010B

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Used NANOMETRICS Nano 9010B
Process: thickness measurement Wafer size: 12" Condition: as is

CARL ZEISS AXIOVERT 200M MAT

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Used CARL ZEISS AXIOVERT 200M MAT
Process: microscope Wafer size: multi Condition: as is

BAL-TEC (Gartan) SCD005

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Used BAL-TEC (Gartan) SCD005
Process: sputter coater Condition: working Wafer size: multi

TECDIA TEC-3005KD

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Used TECDIA TEC-3005KD
Process: CHIP breaking M/C Condition: as is Wafer size: 8"

CARL ZEISS AXIOVERT 200M MAT

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Used CARL ZEISS AXIOVERT 200M MAT
Process: microscope Condition: as is Wafer size: multi

2001 Hitachi Kokusai VR120/ 08S

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Used 2001 Hitachi Kokusai VR120/ 08S
Process: resistivity measurement Wafer size: 12" Condition: as is

SVS MSX-1000

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Used SVS MSX-1000
Process: lift off M/C Condition: as is Wafer size: 4"

BAL-TEC (Gartan) SCD005

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Used BAL-TEC (Gartan) SCD005
Process: sputter coater Condition: working Wafer size: multi

2009 SEMILAB WT-2000PVN

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Used 2009 SEMILAB WT-2000PVN
Process: lifetime measurement Condition: complete

BMR HiEtch-LX200

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Used BMR HiEtch-LX200
Process: ICP etcher Wafer size: 12" Condition: as is

1999 Tel ACT 8

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Used 1999 Tel ACT 8
Wafer size; 8" Process: track Condition: part tool

Nikon OPTIPHOT 300

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Used Nikon OPTIPHOT 300
Process: microscope Condition: complete (1) as is (1) Wafer size: 12"