Dielectric Etch Etch/Ash/Clean - Plasma Processing Currently Configured for: 200mm Current Equ...

Dielectric Etch Etch/Ash/Clean - Plasma Processing Currently Configured for: 200mm Current Equ...

Polysilicon Etch Etch/Ash/Clean - Plasma Processing Currently Configured for: 200mm Current Eq...

Dielectric Etch Etch/Ash/Clean - Plasma Processing Currently Configured for: 200mm Current Equ...

SACVD (Chemical Vapor Deposition) Deposition Equipment Currently Configured for: 200mm Current...

2010 vintage Fully refurbished 415 VAC 3PH 50 HZ

SACVD (Chemical Vapor Deposition) Deposition Equipment Date of Manufacture: 1995-05-25 Current...

still in production, deinstallation date 01.02.25 1) no harddisk in stepper Workstation (EWS) in...

Description CAI Canon FPA 3000 i5+ Wafer Size Range Minimum 150 mm Maximum 200 mm Set Size 200 ...

Coat / Developer

2 available Vintage: 2018/ 1997 Stripper / Asher

Inspection / Measurement