2000 Eaton Nova Axcelis NV GSD 200 EE
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It’s still installed but no longer under power.
It was in Working Condition when decommissioned....
AMAT Endura 5500 Aluminum Interconnect
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PVD (Physical Vapor Deposition)
Deposition Equipment
Currently Configured for: 200mm
Software:...
2000 ASM Advance 400
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ASM Furnace Vertical - Advance 400
2x Reactor Dot. Poly Low Pressure
Wafer Size Range Minimum ...
1999 ASM Advance 400
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ASM Furnace Vertical - Advance 400
2 Reactors atmospheric
Wafer Size Range Minimum 150 mm Maxi...
2008 ASM Advance 400
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ASM Furnace Vertical - Advance 400
2 Reactor atmospheric
Robot defect and need service
Wafer S...
1999 ASM Advance 400
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OFENV01D
Furnace with 2 Tubes
1x Reactor Dot. Poly Low Pressure
1x Reactor Atmosphere WET-OXID...
2019 Tokyo Electron Ltd. CLEAN TRACK ACT 8 COAT ONLY
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Coat only Track
Resist Processing Equipment
Date of Manufacture: 2019-01-01
Currently Configur...
2017 RENA Technologies GmbH RENA BatchW
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Batch Wafer Processing
Etch/Clean - Wet Processing
Date of Manufacture: 2017-01-01
Currently C...
2020 Polyteknik Flextura Sputter
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PVD (Physical Vapor Deposition)
Deposition Equipment
Date of Manufacture: 2020-01-01
Currently...
2000 AMAT MS9 E500 EHPI
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Wafer Size Range Minimum 150 mm Maximum 150 mm Set Size 150 mm
Condition Good
Year of Manufact...
2003 AMAT 200mm Centura II
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Centura MF II
Software: Vita Controller
Indexer: Narrow Body / Tilt out mit Dummy Wafer Storage...
1999 AP&S Customized Soln WET Clean Strip (8''tool)
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2 available
WET Clean Strip (8''tool)
Year of Manufacture 1999 & 2000
Condition Fair
Exterior...








